电子洁净室空气化学污染物检测研究进展

随着芯片制程的降低,对于生产芯片的电子洁净室提出了更高的环境要求,其中检测痕量气态化学污染物是重要的一个环节。文章对国际标准、国家标准、半导体线路图当中对于电子洁净室的环境要求以及不同污染物对芯片制造会有哪些危害进行阐述。论述了当前电子洁净室中对于痕量气体主要的测量方法原理,并针对最低检测限、灵敏度几个方面阐述前人研究。总结了当前用于测量的不同公司的仪器标称性能,并提出不同测量方法针对检测下限和灵敏度提升的主要改进措施。提出了未来可以将传感器阵列与深度学习相结合,在软件和算法层面提高对痕量气体的测量准确度。

Review on Detection of Air Chemical Contamination Based on Electronic Cleanrooms

Trace amounts of gaseous chemical contaminations in electronic clean rooms significantly impact chip manufacturing. To reduce the chip-making process for large-scale integrated circuits, monitor these contaminants becomes a pivotal step. Offer an overview of international, national standards and semiconductor roadmaps, regarding environmental requirements for electronic clean rooms and the potential threats various pollutants pose to chip manufacturing. The principles of the main methods used to measure trace gases in current electronic clean rooms are discussed, with particular focus on the lowest detection limits and sensitivity, based on previous research. The performance specifications of instruments from various manufacturers currently used for measurements have been summarized. Additionally, principal enhancement measures for improving the detection limit and sensitivity specific to different measurement methodologies have been proposed.