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GaN/InGaN应变层临界厚度的计算
引用本文:郑江海.GaN/InGaN应变层临界厚度的计算[J].漳州师院学报,2009(3):68-72.
作者姓名:郑江海
作者单位:漳州师范学院物理与电子信息工程系,福建漳州363000
摘    要:本文主要借鉴PB模型、Fisher模型和Matthews模型并通过优化其中的组分和滑移间距参数,考虑影响临界厚度的相关因素,对GaN/InGaN异质结应变层临界厚度进行理论计算,再结合实验值进行比较分析。发现PB模型比较能准确估计GaN/InGaN异质结应变层临界厚度.最后进一步考虑热应力对临界厚度的影响时,发现对其影响不大.

关 键 词:异质结  应变层  临界厚度

Calculation of the Critical Layer Thickness for GaN/InGaN
ZHENG Jiang-hai.Calculation of the Critical Layer Thickness for GaN/InGaN[J].Journal of ZhangZhou Teachers College(Philosophy & Social Sciences),2009(3):68-72.
Authors:ZHENG Jiang-hai
Institution:ZHENG Jiang-hai (Department of Physics and Electronic Information Engineering, Zhangzhou Normal University, Zhangzhou, Fujian 363000, China)
Abstract:The paper separately calculates the critical layer thickness for an InGaN expitaxial layer growthing on a GaN substrate and proposes with PB model, Fisher modeland Matthews model by analyzing parameters about passion ration and Burgers vector, and then compares with experimental values reported for various GaN/InGaN systems. The CLT calculated by the PB model can yield a better agreement with the measured values. At last, we conclude that the thermal stress has little effect on the critical layer thickness for GaN/InGaN.
Keywords:heterostructure  strain layer  critical layer thickness
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