| 电弧放电法快速合成金刚石薄膜 |
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| 引用本文： | 丁正明 张伟东. 电弧放电法快速合成金刚石薄膜[J]. 上海交通大学学报, 1993, 27(6): 71-74 |
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| 作者姓名： | 丁正明 张伟东 |
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| 作者单位： | 上海交通大学理化中心，上海交通大学理化中心，上海交通大学理化中心，上海交通大学理化中心 |
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| 摘 要： | 本文用电弧放电等离子体ＣＶＤ快速生长金刚石薄膜。用拉曼散射，Ｘ射线衍射、电子显微镜等方法进行了结构表征。文中所论述的恒定的基板温度对沉积金刚石薄膜是非常重要的。
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| 关 键 词： | 金刚石薄膜 电弧放电 化学气相沉积 |
Rapidly Synthesize Diamond Thin Films by Arc Discharge |
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| Ding Zhengming,Zhang Weidong,Zhang Zhiming,Zhuang Zhicheng. Rapidly Synthesize Diamond Thin Films by Arc Discharge[J]. Journal of Shanghai Jiaotong University, 1993, 27(6): 71-74 |
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| Authors: | Ding Zhengming Zhang Weidong Zhang Zhiming Zhuang Zhicheng |
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| Affiliation: | Ding Zhengming;Zhang Weidong;Zhang Zhiming;Zhuang Zhicheng |
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| Abstract: | Diamond thin films were prepared by arc discharge plasma CVD. The structure of the film was characterized by Raman scattering, X-ray diffraction and scanning electron microscope. It's discussed that constant temperatures of substrate are very important to the deposition of the diamond film. |
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| Keywords: | diamond thin film arc discharge chemical vapor deposision X-ray photoelectron spectroscopy |
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