| 单层和多层Ehrlich-Schwoebel势垒对薄膜粗糙度随温度变化的影响 |
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| 引用本文： | 崔婧,唐吉玉,伍达将,刘洋,朱永安.单层和多层Ehrlich-Schwoebel势垒对薄膜粗糙度随温度变化的影响[J].华南师范大学学报(自然科学版),2015,47(5):33-37. |
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| 作者姓名： | 崔婧 唐吉玉 伍达将 刘洋 朱永安 |
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| 作者单位： | 1.(华南师范大学物理与电信工程学院,广州 510006) |
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| 基金项目： | 国家自然科学基金项目(61271271) |
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| 摘 要： | 以Cu为原型，利用动力学蒙特卡洛(KMC)方法模拟了在一定的沉积速率下，单层、多层台阶Ehrlich-Schwoebel(ES)势及温度对成膜质量的影响.结果表明，在一定沉积速率和ES势垒下，薄膜的粗糙度在一定范围内随着温度的升高而降低，当多层ES势垒大于单层ES势垒时，此温度范围受单层ES势垒的影响，而与多层ES势垒关系不大；当单层ES势垒大于多层ES势垒时，多层ES势垒与粗糙度下降的起始温度密切相关，单层ES势垒与粗糙度趋于平稳的温度相关.
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| 关 键 词： | KMC方法 单层ES势垒 多层ES势垒 生长温度 粗糙度 |
| 收稿时间： | 2015-03-05 |
Effects of Ehrlich-Schwoebel Barrier on Thin Film Roughness Variation with Temperature |
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| Institution: | 1.(School of Physics and Telecommunication Engineering,South China Normal University,Guangzhou 510006,China) |
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| Abstract: | The variations of thin film qualities under different ES barriers and temperatures are simulated through Kinetic Monte Carlo method taking Cu as a prototype. It comes to the conclusion that in conditions of fixed deposition rate and ES barrier, in certain temperature range, the roughness of thin film would vary dramatically. When multi-layer ES barrier is no less than mono-layer ES barrier, the temperature range is determined by mono-layer ES barrier and the variation of multi-layer ES barrier has little influence to the range. When multi-layer ES barrier is no more than mono-layer ES barrier, multi-layer ES barrier determines the beginning point of the temperature range and mono-layer ES barrier controls the ending point. |
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