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离子源辅助法制备T iN及等离子体特性研究
引用本文:张茂平, 陈俊芳, 蒙高庆, 向鹏飞, 史磊, 赖秀琼. 离子源辅助法制备T iN及等离子体特性研究[J]. 华南师范大学学报(自然科学版), 2006, (3): 59.
作者姓名:张茂平  陈俊芳  蒙高庆  向鹏飞  史磊  赖秀琼
作者单位:华南师范大学物理与电信工程学院,广东广州,510631;华南师范大学物理与电信工程学院,广东广州,510631;华南师范大学物理与电信工程学院,广东广州,510631;华南师范大学物理与电信工程学院,广东广州,510631;华南师范大学物理与电信工程学院,广东广州,510631;华南师范大学物理与电信工程学院,广东广州,510631
基金项目:国家自然科学基金资助项目(10575039),广东省自然科学基金重点资助项目(05100534),高等学校博士学科点专项科研基金资助项目([2004]165)
摘    要:采用TCP等离子体辅助电子束蒸发沉积技术,在室温条件下的玻璃基片上制备了纳米结构的氮化钛薄膜.运用X衍射技术对该薄膜进行表征.利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律,并分析了气压和功率对等离子体分布的影响.结果表明:离子源源口等离子体密度较大且分布不均匀;反应室内等离子体迅速扩散,密度变小且分布趋于均匀.

关 键 词:氮化钛  顶部感应耦合等离子体源  朗缪尔双探针  电子束蒸发镀膜
文章编号:1000-5463(2006)03-0059-06
收稿时间:2006-05-11
修稿时间:2006-05-11

PREPARATION OF TiN THIN FILMS BY PLASMA ASSISTED ELECTRON BEAM EVAPORATION AND THE DIAGNOSIS OF PLASMA PARAMETERS
ZHANG Mao-ping,CHEN Jun-fang,MENG Gao-qing,XIANG Peng-fei,SHI Lei,LAI Xiu-qiong. PREPARATION OF TiN THIN FILMS BY PLASMA ASSISTED ELECTRON BEAM EVAPORATION AND THE DIAGNOSIS OF PLASMA PARAMETERS[J]. Journal of South China Normal University(Natural Science Edition), 2006, 0(3): 59-64
Authors:ZHANG Mao-ping  CHEN Jun-fang  MENG Gao-qing  XIANG Peng-fei  SHI Lei  LAI Xiu-qiong
Affiliation:School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510631, China
Abstract:Titanium nitride nano-film was prepared on glass at room temperature by means of TCP plasma assisted electron beam evaporation deposition,and TiN film was studied with XRD technique.The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe,and the effect of Ar pressure and RF power were also investigated.The results showed that the plasma ion density at the exit of ion fountain is big but with a poor uniformity,and the plasma ion diffused quickly in reaction chamber and the density of it became small and tend to homogeneous.
Keywords:titanium nitride  TCP  Langmuir double probe  electron beam evaporation deposition
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