离子源辅助法制备T iN及等离子体特性研究

采用TCP等离子体辅助电子束蒸发沉积技术,在室温条件下的玻璃基片上制备了纳米结构的氮化钛薄膜.运用X衍射技术对该薄膜进行表征.利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律,并分析了气压和功率对等离子体分布的影响.结果表明:离子源源口等离子体密度较大且分布不均匀;反应室内等离子体迅速扩散,密度变小且分布趋于均匀.

PREPARATION OF TiN THIN FILMS BY PLASMA ASSISTED ELECTRON BEAM EVAPORATION AND THE DIAGNOSIS OF PLASMA PARAMETERS

Titanium nitride nano-film was prepared on glass at room temperature by means of TCP plasma assisted electron beam evaporation deposition,and TiN film was studied with XRD technique.The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe,and the effect of Ar pressure and RF power were also investigated.The results showed that the plasma ion density at the exit of ion fountain is big but with a poor uniformity,and the plasma ion diffused quickly in reaction chamber and the density of it became small and tend to homogeneous.