| 用于快速光造型的光敏材料特性研究 |
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| 引用本文： | 刘玉,鄂茂华,谢源宏.用于快速光造型的光敏材料特性研究[J].华中科技大学学报(自然科学版),1997(4). |
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| 作者姓名： | 刘玉 鄂茂华 谢源宏 |
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| 作者单位： | 华中理工大学光电子工程系 |
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| 摘 要： | 对于快速成形专用的光敏材料，研究了光引发剂、稀释剂、树脂收缩、边界形变等因素对成形特性的影响，讨论了扫描速度与四因素之间的动态关系，并给出了有关特性曲线及函数式。
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| 关 键 词： | 快速光造型，光敏聚合物，紫外激光，CAD／CAM |
A Study of the Properties of Photocurable Materials for Use ia Rapid Prototyping |
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| Liu Yu E Maohua Xie Yuanhong.A Study of the Properties of Photocurable Materials for Use ia Rapid Prototyping[J].JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE,1997(4). |
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| Authors: | Liu Yu E Maohua Xie Yuanhong |
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| Abstract: | The properties of photocurable materials specially used in rapid prototyping are investigated experimentally. The influences of the photoinitiator , diluter , resin shrinkage and edge deformation on the product by prototyping are emphatically studied . The relationships between the laser scanning speed and four factors are discussed . The curves of relation between them as well as the function ex- pressions in the linear interval are given. |
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| Keywords: | rapid prototyping photopolymer UV laser CAD/CAM |
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