| 多弧离子法制备的Ti(C,N)微结构随C_2H_2/N_2流量比变化的研究(英文) |
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| 引用本文： | 杨礼富,辛煜,范叔平,金宗明.多弧离子法制备的Ti(C,N)微结构随C_2H_2/N_2流量比变化的研究(英文)[J].苏州大学学报(医学版),1997(2). |
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| 作者姓名： | 杨礼富 辛煜 范叔平 金宗明 |
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| 作者单位： | 苏州大学薄膜材料实验室 215006
(杨礼富，辛煜，范叔平)，苏州大学分析与测试中心 215006(金宗明) |
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| 摘 要： | 用多弧离子法在高速钢(W18Cr4V)基底上沉积了Ti(N,C)薄膜,并运用SEM、XRD、XPS对该膜微观结构随进气流量比r=C_2H_2/N_2变化的情况进行了测试和分析。结果表明薄膜随r增加趋于致密,在r值较小时呈现较强的(111)择优取向,随着r值增大,(111)这一取向逐渐变弱,(220)取向渐强,薄膜呈现典型面心立方结构,主要成分为复合相Ti(N,C),膜含有少量石墨相成分存在。
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| 关 键 词： | 多弧离子法 择优取向 SEM XRD XPS |
STUDY OF THE MICROSTRUCTURE OF TI(C,N) FILM PREPARED BY MULTI-ARC ION-PLATING |
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| Yang Lifu Xin Yu Fan Shuping.STUDY OF THE MICROSTRUCTURE OF TI(C,N) FILM PREPARED BY MULTI-ARC ION-PLATING[J].Journal of Suzhou University(Natural Science),1997(2). |
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| Authors: | Yang Lifu Xin Yu Fan Shuping |
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| Abstract: | The Ti (C, N) multi-component coatings are deposited on the HSS steel (W18Cr4V) substrates by muti - arc ion - plating with variationg of reactive gas flow ratio r=C2H2/N2, and the coatings are tested and analysed by XPS, XRD , SEM techniques , The results show that the Ti ( C, N ) coating exhibits a very-strong (111) preferred orientation when the value of r is very low. The (111) peak decreases and (220) peak increases with the increasing of r while the coating becomes more dense . The film shows typical face - centered cubic structure . The component of the film is Ti ( C, N), but there is little graphite component in the coating. |
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| Keywords: | Mud - arc ion - plating preferred orientation SEM XRD XPS |
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