| 光亮剂EN—96在化学镀溶液中行为的研究 |
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| 引用本文： | 常立民 林险峰. 光亮剂EN—96在化学镀溶液中行为的研究[J]. 松辽学刊, 2001, 0(4): 14-16 |
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| 作者姓名： | 常立民 林险峰 |
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| 作者单位： | 常立民（四平师范学院分析测试中心，吉林四平 136000） 林险峰（四平师范学院分析测试中心，吉林四平 136000） |
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| 摘 要： | 本文通过电化学方法探讨了光亮剂EN－96对化学镀镍液的影响。局部阳极和局部阴极极化曲线说明，EN－96的加入对H2PO2^-的氧化反应和Ni^2 的还原反应都有抑制作用。这与实际中获得EN－96对化学镀溶液具有抑制作用的结果相吻合。
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| 关 键 词： | 光亮剂 化学镀 镀液行为 EN－96 |
| 文章编号： | 1000-1840(2001)04-0014-03 |
| 修稿时间： | 2001-07-14 |
A STUDY ON BEHAVIOR OF BRIGHTER EN-96 |
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| CHANG Li_min,LIN Xiang_feng. A STUDY ON BEHAVIOR OF BRIGHTER EN-96[J]. Songliao Journal (Natural Science Edition), 2001, 0(4): 14-16 |
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| Authors: | CHANG Li_min LIN Xiang_feng |
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| Abstract: | The effects of EN-96 on the bath of electroless niokel are investigated by electrochemical method in this paper.The partial anodic ploarization curves and the cathodic ploarization curves show that the exidation of hypophosphitc ion and the nickel deposition are both restrained with the addition of EN-96.These results are in good agreement with deposition rate obtained in eletroless nickel plating. |
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| Keywords: | brighter eletroless bath behavior |
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