| 磁控溅射枪的设计与应用 |
| |
| 引用本文： | 凌世德,程维明.磁控溅射枪的设计与应用[J].上海理工大学学报,1986(3). |
| |
| 作者姓名： | 凌世德 程维明 |
| |
| 作者单位： | 上海机械学院仪器仪表分院
(凌世德)，上海机械学院仪器仪表分院(程维明) |
| |
| 摘 要： | 本文论述了磁控溅射枪的基本设计原理,分析确定了枪的电、磁参量和主要结构参数,并给出了枪的性能测试曲线。
|
| 关 键 词： | 磁控管 溅射 离子枪 离子镀 |
The Design and Application of the Ion Sputter Magnetron Gun |
| |
| Lin Shide Cheng Weiming.The Design and Application of the Ion Sputter Magnetron Gun[J].Journal of University of Shanghai For Science and Technology,1986(3). |
| |
| Authors: | Lin Shide Cheng Weiming |
| |
| Institution: | Lin Shide Cheng Weiming |
| |
| Abstract: | The ion sputter magnetron, (developed since the middle of the 1970's,) is a new method for deposting thin films and is now enjoying great popularity in the field of optical films, decorating coatings and hard coatings. The gun includes electric, magnetic, cooling, insulating and sealing systems. In this paper, the basic design principle of the gun is dealt with, the main parameters of the gun are determined and the test curves of the properties of the gun are presented. Finally, a summary is given of the prospects for the gun and how to improve it in the future. |
| |
| Keywords: | Sputtering Ion plating Magnetron Ion guns |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《上海理工大学学报》浏览原始摘要信息 |
| 点击此处可从《上海理工大学学报》下载免费的PDF全文 |
|
