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The Effect of Discharge Power on the Atmospheric Pressure Non-equilibrium Ar/O2/TiCl4 Plasma Deposition of TiO2 Film
Authors:WANG De-xin    YANG Qin-yu    GUO Ying    DING Ke    ZHANG Jing
Affiliation:1. State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Material Science and Engineering,Donghua University, Shanghai 201620, China
2. College of Science, Donghua University, Shanghai 201620, China
3. State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Material Science and Engineering,Donghua University, Shanghai 201620, China;College of Science, Donghua University, Shanghai 201620, China
Abstract:
Keywords:atmospheric pressure non-equilibrium Ar/O2/TiCl4 plasma  TiO2  discharge power
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