首页 | 本学科首页   官方微博 | 高级检索  
     检索      

化学溶液沉积法制备铁掺杂镍酸镧薄膜的结构及电学性能研究
引用本文:陈如麒,翁嘉文,劳媚媚,徐军,朱贵文.化学溶液沉积法制备铁掺杂镍酸镧薄膜的结构及电学性能研究[J].中山大学学报(自然科学版),2012,51(3):60-62.
作者姓名:陈如麒  翁嘉文  劳媚媚  徐军  朱贵文
作者单位:1. 华南农业大学公共基础课实验教学中心,广东广州,510642
2. 华南农业大学理学院,广东广州,510642
3. 广东药学院物理与电子学教研室,广东广州,510006
基金项目:广东省高校优秀青年创新人才培育资助项目(LYM10036)
摘    要: 采用化学溶液沉积法,在(100)取向单晶硅衬底上制备铁掺杂镍酸镧(LaNi1-xFexO3,LNFeO-x)薄膜,研究了其结构和室温下的导电特性。X射线衍射测试结果表明,经700 ℃ 1 h退火的薄膜呈钙钛矿结构,没有可以观察到的杂相生成。薄膜表面平整、致密,没有微裂痕出现。随着铁含量的增加,薄膜电阻率由1.7 mΩ·cm 增加到 3.9 mΩ·cm。

关 键 词:LaNi1-xFexO3  LNFeO-x  化学溶液沉积法  CSD
收稿时间:2011-12-05;

Structural and Electrical Properties of Fe-doped LaNiO3 Thin Film by Sol-gel Method
CHEN Ruqi , WENG Jiawen , LAO Meimei , XU Jun , ZHU Guiwen.Structural and Electrical Properties of Fe-doped LaNiO3 Thin Film by Sol-gel Method[J].Acta Scientiarum Naturalium Universitatis Sunyatseni,2012,51(3):60-62.
Authors:CHEN Ruqi  WENG Jiawen  LAO Meimei  XU Jun  ZHU Guiwen
Institution:1.Center of Experimental Teaching for Common Basic Courses,South China Agricultural University, Guangzhou 510642,China; 2.College of Science,South China Agricultural University,Guangzhou 510642,China; 3.Guangdong Pharmaceutical University,Guangzhou 510006,China)
Abstract:La1-xFexNiO3(LNFeO-x)thin films were prepared on(100) Si substrates by a chemical solution deposition method(CSD).Their structure and room temperature resitivity were analyzed.X-ray diffraction show that the thin films annealed at 700 ℃ for 1 h were grown in perovskite structure and no secondary phase was detected.The thin films were smooth,density and crack-free.The room temperature resistivity increases from 1.7 Ω·cm to 3.9 Ω·cm as x increases from 0 to 0.15.
Keywords:La1-xFexNiO3  LNFeO-x  chemical solution deposition method  CSD
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《中山大学学报(自然科学版)》浏览原始摘要信息
点击此处可从《中山大学学报(自然科学版)》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号