磁控溅射WOx电致变色薄膜的结构

采用直流反应磁控溅射工艺,以纯钨靶为靶材在ITO玻璃上制备电致变色WOx薄膜,运用XRD衍射方法和扫描隧道显微镜(STM)测试手段对薄膜的晶体结构和微观表面形貌进行了分析,探讨了WOx薄膜的电致变色性能和微观结构之间的关系.实验分析结果发现:磁控溅射得到的WOx薄膜主要是非晶态的,而其在着色状态和退色状态下亦呈非晶特性;电致变色反应使薄膜的颜色发生了可逆变化,必然地也使结构发生了可逆变化.Li 的进出,虽然没有使组成WOx的基本结构发生大的变化,但其微观表面形貌发生较大差异,因为原子团簇的堆积方式向较规则的低能态堆积方式转变.

Structure on Electrochromic Wox Films by Magnetron Sputtering Method

Using pure tungsten as target, WO_(x)films were deposited on ITOglass substrate by DC reactive magnetron sputtering. Through the XRD and STM methods, its crystal structure and surface microstructureare analyzed, and the relations between electrochromic properties and microstructure are discussed. The experimental results show that either in the colored or in the bleached state WO_(x)film deposited by magnetron sputtering method in such a condition is amorphous, as well as it is in the deposited state. The electrochromic action makes the color of the film change reversibly, and consequentiallyalso makes the microstructure change reversibly. The injection or extraction of Li~(+)does not make the basic structure of WO_(x)film change greatly, but makes the surface appearancedifferent, as a result, the accumulatemode of radical clusters tends to be more regular and low-energy mode.