一种图案化镍/硅纳米复合体系的制备

以水热制备的具有规则表面形貌和结构的硅纳米孔柱阵列（Silicon Nanoporous Pillar Array,Si-NPA）为衬底,采用浸渍沉积技术并通过调控溶液中Ni2＋的浓度,制备了表面具有不同图案化结构的镍/硅纳米孔柱阵列复合体系。分析表明,Ni^2＋浓度对Ni/Si-NPA表面形貌和结构有很大的影响：高的Ni^2＋浓度下制备的Ni/Si-NPA能够保持Si-NPA衬底的规则阵列结构特征;而低的Ni^2＋浓度下制备的Ni/Si-NPA其衬底规则的阵列结构几乎完全被破坏。优化了制备具有图案化结构特征的Ni/Si-NPA的实验条件,并对Ni/Si-NPA的形成机理进行了探讨。

Preparation of one Kind of Patterned NickeL/Silicon Nanocomposite Systems

Using regularly patterned silicon nanoporous pillar array (Si-NPA) prepared by hydrothermal etching method as substrate, Ni/Si-NPA nanocomposite system with different surface morphologies has been synthesized by immersion plating method through changing Ni2+ concentration. The results indicated that Ni2+ concentration has a very tremendous influence on the surface appearance and structure of Ni/Si-NPA. Ni/Si-NPA can maintain the basic pillar array structure of Si-NPA substrate under a high Ni2+ concentration, while the regular array structure is nearly completely destroyed when the Ni2+ concentration is enough low. An optimized preparing condition has been obtained to get a designed characteristic structure of the Ni/Si-NPA, and the formation mechanism has been discussed.