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Microstructure controlling of Ti/N particles dissipated energy to superficial layer of titanium nitride film
作者姓名:MAZhongquan  ZHANGQin
作者单位:[1]DepartmentofPhysics,ShanghaiUniversity,Shanghai200436,China [2]DepartmentofChemistry,ShanghaiUniversity,Shanghai200436,China
摘    要:The titanium nitride (TiNx) thin film with a controllable surface structure was fabricated by the dc-reactive magnetron sputtering technique, and the variation of microstructure in the surface layer with the energy of condensed adatom was investigated through X-ray diffraction (XRD) pattern and transmission electron microscope(TEM). It was found that the lattice parameters and the full width at half maximum (fwhm) of XRD peak on the top layers in the preferred orientation of (111) and (002) were closely correlated to the impacting induced phase composition, compressive strain, crystallite size and the fault density of the thin films. In the theory, a new means was used to model the atomistic process of per condensed adatom. The average energy at least in the minimum energy state of the incorporate adatom on TiN surface layer was statistically formulized through a careful consideration of dynamical process, which properly interpreted the experimental observations.

关 键 词:微观结构  钛/氮薄膜  耗散能量  X射线衍射  腐蚀防护
收稿时间:2003-06-20
修稿时间:2003-11-12

Microstructure controlling of Ti/N particles dissipated energy to superficial layer of titanium nitride film
MAZhongquan ZHANGQin.Microstructure controlling of Ti/N particles dissipated energy to superficial layer of titanium nitride film[J].Chinese Science Bulletin,2004,49(3):230-234.
Authors:Email author" target="_blank">Zhongquan?MaEmail author  Qin?Zhang
Institution:MAZhongquan & ZHANG Qin Department of Physics, Shanghai University, Shanghai 200436, China; Department of Chemistry, Shanghai University, Shanghai 200436, China
Abstract:The titanium nitride (TiNx) thin film with a controllable surface structure was fabricated by the de-reactive magnetron sputtering technique, and the variation of microstructure in the surface layer with the energy of condensed adatom was investigated through X-ray diffraction (XRD) pattern and transmission electron microscope (TEM). It was found that the lattice parameters and the full width at half maximum (fwhm) of XRD peak on the top layers in the preferred orientation of (111) and (002) were closely correlated to the impacting induced phase composition, compressive strain, crystallite size and the fault density of the thin films. In the theory, a new means was used to model the atomistic process of per condensed adatom. The average energy at least in the minimum energy state of the incorporate adatom on TiN surface layer was statistically formulized through a careful consideration of dynamical process, which properly interpreted the experimental observations.
Keywords:TiNx thin film  average deposition energy  microstruc-ture of thin film  energetic impact  
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