| 离子束轰击法金刚石薄膜抛光 |
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| 引用本文： | 陈俊,杨保雄.离子束轰击法金刚石薄膜抛光[J].北京科技大学学报,1993,15(5):503-507. |
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| 作者姓名： | 陈俊 杨保雄 |
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| 作者单位： | 北京科技大学材料科学与工程系
(陈俊，杨保雄，王建军)，北京科技大学材料科学与工程系(吕反修) |
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| 摘 要： | 本文采用氩离子束轰击法，对不同晶体学表面形貌的ＣＶＤ金刚石膜进行抛光处理。结果表明，对不同表面开貌的金刚石膜，应合理选择离子束轰击入射角，提高离子束加速电压有利于提高抛光效率，（１００）择优生长的金刚石膜最容易得到高的表面平整度。
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| 关 键 词： | 金刚石 薄膜 抛光 离子束轰击法 |
Polishing of CVD Diamond Films by Ion Beam Irradiation |
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| Chen Jun Yang Baoxiong Wang Jianjun Lu Fanxiu.Polishing of CVD Diamond Films by Ion Beam Irradiation[J].Journal of University of Science and Technology Beijing,1993,15(5):503-507. |
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| Authors: | Chen Jun Yang Baoxiong Wang Jianjun Lu Fanxiu |
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| Institution: | Chen Jun Yang Baoxiong Wang Jianjun Lu Fanxiu Department of Materials Science and Engineering |
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| Abstract: | To improve the surface roughness of CVD diamond films, ion beam milling was used to polish the film. The results of this experiment indicate that the ideal incident angle of ion beam varies with the surface morphology and that high accelaration voltage of ion beam is beneficial to achieving high polishing rate. It was also found that the film exposing (100) facets can be most easily polished to achieveRa 28 nm surface roughness. |
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| Keywords: | diamond film polishing ion beam / cvddiamond |
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