| 铂-硅系复合电极的界面反应及电特性 |
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| 引用本文： | 李思渊,贾笑天,李寿嵩,沈明智,殷之平.铂-硅系复合电极的界面反应及电特性[J].应用科学学报,1988,6(1):78-85. |
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| 作者姓名： | 李思渊 贾笑天 李寿嵩 沈明智 殷之平 |
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| 作者单位： | 兰州大学 |
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| 摘 要： | 本文对Al-Ti-Pt-Si、Al-Mo-Pt-Si、Al-Ti-Si等电极系统薄膜间的相互扩散和反应,利用电子能谱分析、扫描电镜、电学等方法进行了全面研究,并对相应的作用机制也进行了讨论.
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| 收稿时间： | 1985-02-13 |
| 修稿时间： | 1985-08-14 |
INTERFACIAL REACTIONS AND CHARACTERISTICS OF Pt-Si SYSTEM COMPLEX ELECTRODES |
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| LI SIYUAN,JIA XIAOTIAN,LI SHOUSONG,SHEN MINGZHI,YIN ZHIPING.INTERFACIAL REACTIONS AND CHARACTERISTICS OF Pt-Si SYSTEM COMPLEX ELECTRODES[J].Journal of Applied Sciences,1988,6(1):78-85. |
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| Authors: | LI SIYUAN JIA XIAOTIAN LI SHOUSONG SHEN MINGZHI YIN ZHIPING |
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| Institution: | Lanzhou University |
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| Abstract: | In this paper, interfacial reactions and characteristics of multi-layer metal filmson silicon surface such as Al-Ti-Pt-Si, Al-Mo-Pt-Si, Al-Ti-Si etc. are studied systematically. The results of electron spectroscopy analyses, scanning electron microscope and electrical methods of the layered structures are presented, and action mechanisms of these interface effects are discussed. |
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