首页 | 本学科首页   官方微博 | 高级检索  
     检索      

强流电子枪近阴极发射面区的分析与计算
引用本文:刘炳琮,王忠.强流电子枪近阴极发射面区的分析与计算[J].西安交通大学学报,1997,31(2):12-19.
作者姓名:刘炳琮  王忠
作者单位:西安交通大学
摘    要:近阴极发射面区的分析与计算是强流电子枪计算过程的一个关键环节.文中提出了该区在温度限制下交叉电磁场空间电荷流的理论分析,与Kino短枪流理论相结合,可以对交叉电磁场空间电荷流进行完整的计算.在此基础上研制的C形带状强流电子枪计算软件包已用于实际电子枪的计算,计算结果与实测一致

关 键 词:强流电子束  空间电荷限制  温度限制

Analysis and Calculations of the Region Quite Close to Cathode Emission Surface in High Current Electron Gun
Liu,Bingcong,Wang,Zhong.Analysis and Calculations of the Region Quite Close to Cathode Emission Surface in High Current Electron Gun[J].Journal of Xi'an Jiaotong University,1997,31(2):12-19.
Authors:Liu  Bingcong  Wang  Zhong
Abstract:In a high current electron gun, the computation of the region quite close to a ca thode emission surface is the key to the computation of electron beams. In this paper, the theoretical analysis and computation methods for space charge flows under two limitations in the crossed electric magnetic field are provided. Under the temperature limitation, the analysis and computation formulas of the space charge flow in the crossed electric magnetic field are presented. In computing the space charge flow under the space charge limitation, Kino short gun theorem and its formulas are used. The computation methods and the program chart are presented. The computation software for a C shaped strip high current electron gun has been applied to a practical design successfully. The computational results are consistent with the measurement data.
Keywords:high  current  electron  beam  space  charge  limitation  tempaerture  limitation  
本文献已被 CNKI 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号