| 真空磁控溅射高压稳流源的研制 |
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| 引用本文： | 闵子建. 真空磁控溅射高压稳流源的研制[J]. 首都师范大学学报(自然科学版), 1997, 0(Z1) |
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| 作者姓名： | 闵子建 |
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| 作者单位： | 首都师范大学物理系 |
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| 摘 要： | 本文介绍了真空磁控溅射镀膜设备中必不可少的溅射稳流电源的研制．经过半年来的连续运行，证明性能稳定可靠
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| 关 键 词： | 溅射，磁性膜，稳流电源 |
Development of the HV Stabilized Current Supply of Vacuum System for Depositing by Magnetic Controlled Sputtering |
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| Min Zijian. Development of the HV Stabilized Current Supply of Vacuum System for Depositing by Magnetic Controlled Sputtering[J]. Journal of Capital Normal University(Natural Science Edition), 1997, 0(Z1) |
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| Authors: | Min Zijian |
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| Abstract: | This paper presents the design and manufacture of the high voltage stabilized current supply which is necessary applied to vacuum system for depositing magnetic films by magnetic controlled sputtering. Its performentce is stable and reliable by continually operating for several months. |
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| Keywords: | sputtering magnetic films stabilized current supply. |
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