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Progress of graphene growth on copper by chemical vapor deposition: Growth behavior and controlled synthesis
Authors:LaiPeng Ma  WenCai Ren  ZaiLi Dong  LianQing Liu  HuiMing Cheng
Institution:1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
2. State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, China
Abstract:Recently, chemical vapor deposition (CVD) on copper has been becoming a main method for preparing large-area and high- quality monolayer graphene. In this paper, we first briefly introduce the preliminary understanding of the microstructure and growth behavior of graphene on copper, and then focus on the recent progress on the quality improvement, number of layers control and transfer-free growth of graphene. In the end, we attempt to analyze the possible development of CVD growth of graphene in future, including the controlled growth of large-size single-crystal graphene and bilayer graphene with different stacking orders.
Keywords:graphene  controlled growth  chemical vapor deposition  copper substrate
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