| 镀制工艺对金刚石薄膜透射率的影响 |
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| 引用本文： | 李云.镀制工艺对金刚石薄膜透射率的影响[J].科学技术与工程,2012,12(33):8984-8986. |
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| 作者姓名： | 李云 |
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| 作者单位： | 西安邮电大学理学院,西安,710121 |
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| 摘 要： | 用磁控溅射法制备金刚石薄膜,研究了工作气压,溅射电流、镀膜时间三个参数对金刚石薄膜透射率的影响。得到最佳工艺参数:工作气压1.3 Pa,溅射电流0.4 A,镀膜时间2 min。镀制的金刚石薄膜可以作为红外元件的保护膜与增透膜。
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| 关 键 词： | 磁控溅射 金刚石薄膜 透射率 |
| 收稿时间： | 7/9/2012 1:14:15 PM |
| 修稿时间： | 7/27/2012 4:56:20 PM |
The Influence of Technologic Conditions to Transmittance of Diamond Film |
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| li yun.The Influence of Technologic Conditions to Transmittance of Diamond Film[J].Science Technology and Engineering,2012,12(33):8984-8986. |
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| Authors: | li yun |
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| Institution: | (School of Science,Xi’an University of Post and Telecommunications,Xi’an 710121,P.R.China) |
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| Abstract: | Diamond films were successfully prepared by magnetron sputtering. Then the influence of technologic conditions to the transmittance of diamond film was researched, such as work vacuum, sputtering current and preparing time. Optimal technologic conditions are obtained, they are 1.3 Pa work vacuum, 0.4A sputtering current and 2min preparing time. |
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| Keywords: | Magnetron Sputtering Diamond film Transmittance |
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