| X射线光刻机的开发研制 |
| |
| 引用本文： | 李连进.X射线光刻机的开发研制[J].天津理工大学学报,2002,18(3):79-83. |
| |
| 作者姓名： | 李连进 |
| |
| 作者单位： | 天津理工学院,机械工程学院,天津,300191 |
| |
| 摘 要： | X射线光刻是一种能满足大规模集成电路生产的加工技术 .本文论述了X射线光刻技术的发展历史和前景 ,阐述X射线光刻机的光源、曝光系统、掩摸和步进驱动平台等的主要结构和研制动机 ,提出在X射线光刻机设计中要注意的几个主要问题
|
| 关 键 词： | 光刻机 X射线 集成电路 |
| 文章编号： | 1004-2261(2002)03-079-05 |
| 修稿时间： | 2002年3月14日 |
Research on the exploit of the X-ray photo-etching machine |
| |
| LI Lian,jin.Research on the exploit of the X-ray photo-etching machine[J].Journal of Tianjin University of Technology,2002,18(3):79-83. |
| |
| Authors: | LI Lian jin |
| |
| Abstract: | The X ray photo etching is a main technology for the production of the large scale integrated circuit.In the paper, history and recent Development of this technology are briefly reviewed, introduced the X ray photo etching machine for the objective of research and main structure from the aspects of light source and illuminate systems and mask and stepping platform,and bring up to need attentive the primary problem in this machine design. |
| |
| Keywords: | photo etching machine X ray integrated circuit |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
