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铝的壁垒型阳极氧化膜的透射电镜观察
引用本文:刘海平 徐源. 铝的壁垒型阳极氧化膜的透射电镜观察[J]. 北京科技大学学报, 1990, 12(2): 166-170
作者姓名:刘海平 徐源
作者单位:北京有色金属研究总院204室,北京科技大学表面科学与腐蚀工程系
摘    要:发现了(NH_4)_2MoS_4水溶液中可生成铝的壁垒型阳极氧化膜。用超薄切片,透射电镜结合离子注入惰性原子标记层的技术对膜的形貌、成分和生长过程中的离子迁移进行了观察和分析;用EDAX分析方法来探测到膜中含有溶液阴离子的成分,阳极氧化过程中膜在基体/膜界面和膜/溶液界面同时生长。阳极氧化的电流密度为1.0mA/cm~2时,Al~(3+)离子的表观迁移率为0.44。

关 键 词:铝 壁垒型膜 阳极氧化 透射电镜

Observation of Barrier Anodic Films on Aluminium by TEM
Liu Hoping Xu Yuan Zhang Wenqi. Observation of Barrier Anodic Films on Aluminium by TEM[J]. Journal of University of Science and Technology Beijing, 1990, 12(2): 166-170
Authors:Liu Hoping Xu Yuan Zhang Wenqi
Affiliation:Liu Hoping Xu Yuan Zhang Wenqi (Beijing General Research Institute for Non-Ferrous (Dept. of Surface Sci. and Corro. Eng.
Abstract:It was found that barrier anodic film can be formed on aluminium in (NH4)2MoS4 aqueous solution. Ultramicrotomed sectioning allied with analytical TEM and ion implantation of xenon marker techniques were employed to investigate the morphology, chemical composition of the film and to measure the ion migration during anodizing. Species characterizing the electrolyte (Mo) was not detected in the film section with EDAX analysis. It was found that film growth proceeds at both the alumium/film and the film/electrolyte interfaces. The apparent migration ratio of aluminium ions is 0.44 when the anodizing current density is 1.0mA/cm2 .
Keywords:(NH4)2MoS4   aluminium   barrier film   anodizing   TEM  
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