| 在不同退火温度下射频磁控溅射CNx膜的电子场发射性质 |
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| 引用本文： | 李哲奎,李俊杰,金曾孙,吕宪义,白晓明,郑冰,田宏伟,于狭升. 在不同退火温度下射频磁控溅射CNx膜的电子场发射性质[J]. 吉林大学学报(理学版), 2005, 43(2): 182-184 |
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| 作者姓名： | 李哲奎 李俊杰 金曾孙 吕宪义 白晓明 郑冰 田宏伟 于狭升 |
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| 作者单位： | 1. 延边大学物理系, 延吉 133002; 2. 吉林大学超硬材料国家重点实验室, 长春 130012; 3. 吉林大学材料科学与工程学院材料科学系, 长春 130012 |
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| 摘 要： | 对磁控溅射沉积得到的CNx膜在不同温度下进行真空退火, 退火前后CNx膜的化学键合采用X射线光电子能谱表征. 结果发现, 沉积的CNx膜中氮原子与sp, sp2, sp3杂化碳原子相键合, 并对经过退火的CNx膜的键合结构和电子场发射特性的影响进行了研究.
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| 关 键 词： | 射频磁控溅射 CNx膜 退火温度 电子场发射 |
| 文章编号： | 1671-5489(2005)02-0182-03 |
| 收稿时间： | 2004-04-07 |
| 修稿时间： | 2004-04-07 |
Electron Field Emission of RF Magnetron Sputtered CNx Films Annealed at Different Temperatures |
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| LI Zhe-kui,LI Jun-jie,JIN Zeng-sun,U Xian-yi,BAI Xiao-ming,ZHENG Bing,TIAN Hong-wei,YU Xia-sheng. Electron Field Emission of RF Magnetron Sputtered CNx Films Annealed at Different Temperatures[J]. Journal of Jilin University: Sci Ed, 2005, 43(2): 182-184 |
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| Authors: | LI Zhe-kui LI Jun-jie JIN Zeng-sun U Xian-yi BAI Xiao-ming ZHENG Bing TIAN Hong-wei YU Xia-sheng |
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| Affiliation: | 1. Department of Physics, Yanbian University, Yanji 133002, Jilin Province, China;2. State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;3. Department of Materials Science, College of Materials Science and Engineering, Jilin University,Changchun 130012, China |
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| Abstract: | The carbon nitride films deposited by RF magnetron sputtering in a pure N2 discharge were annealed in vacuum up to 900 ℃. The chemical bonding of the films was studied using X-ray photoelectron spectroscopy and Raman spectra. It was found that the nitrogen atoms were bound to sp, sp2 and sp3 hybridized carbon atoms in as-deposited films. The effects of the thermal annealing on the bonding structure and the electron field emission characteristics of CNx films were investigated. |
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| Keywords: | RF magnetron sputtering CN_x film annealing temperature electron field emission |
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