| 离子束辅助沉积技术对薄膜光学特性的影响 |
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| 引用本文： | 冯伟亭,陈桂莲,周鹏飞.离子束辅助沉积技术对薄膜光学特性的影响[J].上海理工大学学报,1992(1). |
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| 作者姓名： | 冯伟亭 陈桂莲 周鹏飞 |
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| 作者单位： | 上海机械学院仪器仪表学院
(冯伟亭，陈桂莲)，上海机械学院仪器仪表学院(周鹏飞) |
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| 摘 要： | 用计算机模拟离子辅助薄膜沉积过程和工艺实验,发现离子辅助能够提高薄膜的聚集密度、附着力,改善薄膜光学特性。然而,高能离子束诱发薄膜材料相当大的吸收,导致该技术几乎无法使用。作者通过对碲化铅薄膜材料理论和工艺分析,证实了低能、高密度离子束辅助是一种极有发展前途的新技术。
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| 关 键 词： | 离子辅助沉积 碲化铅薄膜 化学计量比 |
THE EFFECTS OF IAD TECHNIQUE UPON OPTICAL PROPERTIES OF THIN FILMS |
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| Feng Weiting Chen Guilian Zhou Pengfei.THE EFFECTS OF IAD TECHNIQUE UPON OPTICAL PROPERTIES OF THIN FILMS[J].Journal of University of Shanghai For Science and Technology,1992(1). |
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| Authors: | Feng Weiting Chen Guilian Zhou Pengfei |
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| Institution: | Feng Weiting Chen Guilian Zhou Pengfei |
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| Abstract: | Through computer simulated process of Coating deposition, we find that IAD (ionassisted deposition) technique can improve the density, adherence and optical properties of thin films. However, the high energy ion beam may result in a large absorption of film materials and thus makes the technique useless. It has been found that the low energy, high current density ion beam is a most promising technique in the field of optics of thin films by independent researches on theory and experiment, respectively. |
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| Keywords: | IAD PbTe thin films Stoichiometry |
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