Catalyst enhanced chemical vapor deposition of nano-particle nickel films on teflon surface |
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| Authors: | Endong Liu Wenfang Feng Jinlan Zhou Kaichao Yu |
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| Institution: | (1) College of Resources and Environmental Engineering, Wuhan University of Technology, Wuhan, 430070, Hubei, China;(2) Department of Chemistry, Huazhong University of Science and Technology/Hubei Key Laboratory of Materials Chemistry and Service Failure, Wuhan, 430074, Hubei, China |
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| Abstract: | Films formed with nanosized nickel particles on teflon surface were prepared by means of catalyst enhanced chemical vapor
deposition (CECVD) with Ni(dmg)2, Ni(acac)2, Ni(hfac)2, Ni(TMHD)2, and Ni(cp)2 as precursors, and complexes Pd(hfac)2, PdCl2 and Pd(η
3-2-methylallyl)acac as catalyst under carrier gas (H2). The film growth rate depends on the precursors and substrate temperature. The chemical value, purity and surface morphology
of the Ni particle films were characterized by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM).
The films obtained were shiny with silvery color, and consisted of grains with a particle size of 50–140 nm. The Ni was metallic
of which the purity was about 90%–95% from XPS analysis. SEM micrograph showed that the film had good morphology.
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| Keywords: | catalyst enhanced chemical vapor deposition teflon nano-particle nickel film |
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