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高功率准分子激光沉积类金刚石膜的热稳定性
引用本文:金哲,李俊杰,盖同祥,林景波,李哲奎,张寿,彭鸿雁,金曾孙.高功率准分子激光沉积类金刚石膜的热稳定性[J].吉林大学学报(理学版),2003,41(4):497-500.
作者姓名:金哲  李俊杰  盖同祥  林景波  李哲奎  张寿  彭鸿雁  金曾孙
作者单位:1. 延边大学理工学院, 延吉 133002; 2. 吉林大学超硬材料国家重点实验室, 长春 130012
摘    要:在不同温度下(200~ 800 ℃) 将高功率准分子激光溅射方法沉积的类金刚石膜进行退火实验. 利用Raman和XPS光谱分析类金刚石膜在退火过程中的化学键合结构变化. 结果表明, 类金刚石膜是由少量的sp2 C键和大量的sp3 C键组成的非晶态碳膜. 在退火温度小于600 ℃范围内, 类金刚石膜的热稳 定性较好; 退火温度高于600 ℃时, 类金刚石膜中的sp3 C键逐渐向sp 2 C键转变, 当退火温度升到800 ℃时, 类金刚石膜中sp3 C键含量由 退火前的大约70%下降到40%. 可见, 高温退火能导致类金刚石膜的石墨化趋势.

关 键 词:准分子激光沉积  类金刚石膜  热稳定性  退火温度  
文章编号:1671-5489(2003)04-0497-04
收稿时间:2003-02-25
修稿时间:2003年2月25日

Thermal Stability of Diamond-like Films Deposited by High Power Excime Laser
JIN Zhe,LI Jun-jie,GAI Tong-xiang,LIN Jing-bo,LI Zhe-kui,ZHANG Shou.Thermal Stability of Diamond-like Films Deposited by High Power Excime Laser[J].Journal of Jilin University: Sci Ed,2003,41(4):497-500.
Authors:JIN Zhe  LI Jun-jie  GAI Tong-xiang  LIN Jing-bo  LI Zhe-kui  ZHANG Shou
Institution:1. School of Science and Engineering, Yanbian University, Yanji 133002, China; 2. National Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China
Abstract:The diamond-like films deposited by high power excime laser were annealed at different temperatures (200~800 ℃) to study their therm al stability. Raman and XPS spectra were used to characterize the change of the chemical bonding structure of the diamond-like films annealed at different temperatures. The results show that the diamond-like films are composed of fewer sp2 C bonds and larger sp3 C bonds fractions. When annea ling temperature was varied in the range of 200~600 ℃, the films have a good thermal stability. But when annealing temperature was increased continually from 6 00 ℃ to 800 ℃, the transformation from sp3 C to sp2 C occurred in the films. Thus, higher temperature annealing can lead to the formation of larger fractions of sp2 C in the films, the content of sp 3 C drops from about 70% to 40% as annealing temperature is increased from 200 ℃ to 800 ℃.
Keywords:excime laser deposition  diamond-like film  thermal stability  annealing temperature
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