| Co/Si多层膜的模型结构研究 |
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| 引用本文： | 马忠元,杨宇,吴兴惠. Co/Si多层膜的模型结构研究[J]. 云南大学学报(自然科学版), 1999, 21(1): 35-37 |
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| 作者姓名： | 马忠元 杨宇 吴兴惠 |
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| 作者单位： | 云南大学物理系,昆明,650091 |
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| 摘 要： | 对小角Ｘ射线衍射法测出的Ｃｏ／Ｓｉ多层膜的平均折射率修正值为负的原因作了进一步的分析，提出了修正的具有化合物层的多层膜结构模型，运用光学多层膜理论计算小角衍射强度时代入了负的折射率修正值δ，得到的理论计算曲线与实验曲线趋于一致．
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| 关 键 词： | Co／Si多层膜；小角衍射；折射率修正值 |
The Research of Structure Model for Co/Si Multilayer |
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| MA Zhongyuan,YAN Yu,WU Xinghui. The Research of Structure Model for Co/Si Multilayer[J]. Journal of Yunnan University(Natural Sciences), 1999, 21(1): 35-37 |
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| Authors: | MA Zhongyuan YAN Yu WU Xinghui |
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| Abstract: | To analyze the negative revised average refraction index value of Co/Si multilayer measured by small angle X ray diffraction further,a corrected multilayer structure model with compound layer has been advanced.Puting the negative revised refraction index value into the optic multilayer theory caculation,the theoretical diffraction curve is consistent with the experimental one. |
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| Keywords: | Co/Si multilayer small angle diffraction revised refraction index value |
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