技术深度对专利价值的影响研究

技术深度反映创新主体在特定技术领域中专门知识和技能的累积程度，已有研究发现不同深度的技术知识对创新过程和创新结果产生影响，技术深度对专利价值的影响机制是一个值得探讨的有趣问题。本研究以2000～2021年USPTO的中国授权发明专利数据为样本，利用相关性分析方法对4种技术深度测度方法进行一致性检验，遴选出Ozman方法，并对技术深度进行测度。在此基础上，使用负二项回归模型，以被引次数为专利价值的代理变量，使用负二项回归模型对技术深度对专利价值的影响关系进行实证研究。结果表明，技术深度对专利价值有显著的正向影响。本研究认为，在培育高价值专利的政策目标下，增加技术深度是另一个重要的政策工具路径，支持“专精特新”企业的创新政策有望诱导技术深度的持续进步和培育高价值专利。

Research on the Influence of Technological Depth on Patent Value

Technological depth reflects the degree of accumulation of expertise and skills in a particular technology field. Theoretical research has found that different depths of technological knowledge have an impact on innovation process and innovation output. Taking the data of Chinese granted utility patents of USPTO from 2000 to 2021 as samples, this paper uses Pearson correlation coefficient to test the consistency of four technological depth measurement methods, and selects Ozman method according to the results of consistency test. On this basis, this paper uses a negative binomial regression model to study the effect of technological depth on patent value with the number of citations as a proxy variable. The results show that technological depth has a significant positive impact on patent value. The policy significance is that increasing technological depth is another important path to cultivate high-value patents. Innovation policies that effectively support "specialized and sophisticated" enterprises can induce continuous progress of technological depth and cultivate high-value patents.