湿法化学清洗设备的防护措施

主要介绍了半导体晶圆RCA清洗工艺及化学涅法清洗设备在使用时安全隐患和防腐保护措施的应用。在设备的主体，电气控制系统、加热系统、排放系统等部分的设计的独创性和实用性得到广泛的应用。一定程度上解决了该设备在应用中的安全隐患，具有重要的意义。

The Protection of Wet Bench Equipment

This Article introduces the clean process of RCA for silicon wafer, and the design and apply in the safety measures of this kind of silicon wafer clean equipment. It represents creativity and practicability of Wet Bench in frame material,the electricity controls system,the heating system and exhaust system. It gives good yield for the safety problems of this kind of clean equipments.