| 直流电弧等离子体喷射法制备金刚石薄膜 |
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| 引用本文： | 李荣志,阎震.直流电弧等离子体喷射法制备金刚石薄膜[J].北京理工大学学报,1991,11(2):48-52. |
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| 作者姓名： | 李荣志 阎震 |
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| 作者单位： | 北京理工大学材料科学研究中心
(李荣志，阎震，钟生东，张忠廉)，北京理工大学材料科学研究中心(朱鹤孙) |
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| 摘 要： | 设计了一种以较高速度合成金刚石薄膜的装置。这种装置是在阴极和阳极间用甲烷氢气及氩气产生高密度等离子体射流。等离子体射流以高速度喷射于被冷却的基底上,从而形成金刚石薄膜。
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| 关 键 词： | 金刚石 薄膜 等离子体喷射 |
Preparation of Diamond Films With Direct Current Arc Plasma Jet |
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| Li Rongzhi Yan Zhen Zhong Shengdong Zhang Zhonglian Zhu Hesun.Preparation of Diamond Films With Direct Current Arc Plasma Jet[J].Journal of Beijing Institute of Technology(Natural Science Edition),1991,11(2):48-52. |
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| Authors: | Li Rongzhi Yan Zhen Zhong Shengdong Zhang Zhonglian Zhu Hesun |
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| Institution: | Research Centre of Material Science |
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| Abstract: | An apparatus is presented in this paper , designed for the synthesis of diamond films at a rather high deposition rate . With this apparatus , a plasma jet consisting of a mixture of methane , hydrogen and argon is realized at a high density between the anode and cathode . Diamond film is synthesized while the plasma flow rushes to a cooled substrate at high speed . |
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| Keywords: | diamond film arc discharge plasma jet |
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