| 消失场荧光测量的理论和应用研究 |
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| 引用本文： | 袁一方. 消失场荧光测量的理论和应用研究[J]. 上海理工大学学报, 1995, 0(1) |
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| 作者姓名： | 袁一方 |
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| 作者单位： | 华东工业大学 |
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| 摘 要： | 消失场荧光技术已被广泛应用在工业、生物和医学等领域的研究工作中．本文给出各种分层结构中消失场分布的严密电磁理论．在生物和医学上，利用受激荧光强度正比于局部电场能量的规律，可根据测得的相对荧光强度算出细胞和基板的间距．文中还给出一些消失场荧光测量的应用．
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| 关 键 词： | 荧光测量；消失场；电磁场理论 |
A study of the theory and application of fluorescence measurement of evanescent field |
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| Yuan Yifang,O S Heavens. A study of the theory and application of fluorescence measurement of evanescent field[J]. Journal of University of Shanghai For Science and Technology, 1995, 0(1) |
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| Authors: | Yuan Yifang O S Heavens |
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| Affiliation: | Yuan Yifang; O S Heavens(East China University of Technology) (York University UK) |
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| Abstract: | Fluorescence technique of evanescent field has been widely used in the research work of industry, biology and medicine. In this paper, rigorous electromagnetic theory of evanescent field distribution in various layered structure is dealt with. By means of the law that stimulanted fluovescence intensity is proportional to the energy of local electrical field and the measured relative fluorescence intensity, the distance between cell and glass substrate can be derived. Some applications of fluorescence measurement of evanescent field are also presented in this paper. |
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| Keywords: | fluorescence measurement evanescent field electromagnetic field theory |
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