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等离子鞘层在等离子弧焊中的应用
引用本文:卢亚静,胡绳荪,单平,罗震. 等离子鞘层在等离子弧焊中的应用[J]. 天津大学学报(自然科学与工程技术版), 2003, 36(5): 562-566
作者姓名:卢亚静  胡绳荪  单平  罗震
作者单位:天津大学材料科学与工程学院,天津大学材料科学与工程学院,天津大学材料科学与工程学院,天津大学材料科学与工程学院 天津300072,天津300072,天津300072,天津300072
摘    要:指出了尾焰电压和等离子云探针检测方法的本质,都是检测电弧的等离子焰,根据等离子体鞘层理论分析,用尾焰电压和等离子云探针检测等离子焰时,在金属检测板或金属探针表面附近将产生鞘层电压,相对于被焊工件为负电压值,鞘层电压与等离子体的温度及等离子体组分有关,动态平衡时,在金属检测板或金属探针表面的负电压值为一常量,可以根据公式计算该电压值,文中提出了一种无源探针检测等离子云的方法,该方法更加证明了等离子焰检测中等离子鞘层理论的重要性。

关 键 词:等离子弧焊 等离子鞘层 等离子焰 尾焰电压 等离子云探针检测法 鞘层电压
文章编号:0493-2137(2003)05-0562-05
修稿时间:2002-09-13

Application of Plasma Sheath in Plasma Arc Welding
LU Ya-jing,HU Sheng-sun,SHAN Ping,LUO Zhen. Application of Plasma Sheath in Plasma Arc Welding[J]. Journal of Tianjin University(Science and Technology), 2003, 36(5): 562-566
Authors:LU Ya-jing  HU Sheng-sun  SHAN Ping  LUO Zhen
Abstract:The high quality of the weld and the p ro cess stability in plasma arc welding can be obtained by the detection of the sta te of the keyhole (fully penetrated or not) through the efflux plasma voltage an d plasma cloud voltage. It is found that the essence of the efflux plasma voltag e detection and the plasma cloud probe detection is uniform. Both the detections are for the plasma flame. On the basis of the theory of plasma sheath, there is a negative potential (sheath voltage) near the surface of the detection plate o r the metallic probe. The value of the sheath voltage depends on the temperature and the component of the plasma. It is also found that the sheath voltage is a constant when the process is in dynamic equilibrium and a corresponding formula is brought forward. At the same time, a new device without electrical source to detect the plasma cloud is set up, which verifies the validity and the importanc e of the theory of plasma sheath.
Keywords:plasma sheath  keyhole plasma arc weldin g  fully penetrated  efflux voltage
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