The preparation and characterization of amorphous SiCN thin films |
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Authors: | Li Jin-chai Lu Xian-feng Zhang Zi-hong Guo Huai-xi Ye Ming-sheng |
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Affiliation: | (1) School of Physics and Technology, Wuhan University, 430072 Wuhan, China |
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Abstract: | Radio Frequency plasma enhanced Chemical Vapor Deposition (RF CVD) using N2, SiH4 and C2H4 as the reaction sources was used to prepare amorphous ternary Si x C y N z thin films. The chemical states of the C, Si and N atoms in the films were characterized by X-ray photoelectron spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). The refractive indexn, extinction coefficientk and optical band gapE opt of the thin films were investigated by UV-visible spectrophotometer and spectroscopic ellipsometer. The results show that a complex chemical bonding network rather than a simple mixture of Si3N4, SiC, CN x and a-C etc., may exist in the ternary thin films. Then's of the films are within the range of 1. 90–2. 45, andE opt's of all samples are within the range of 2. 71–2. 86 eV. Foundation item: Supported by the National Natural Science Foundation of China (19975035) Biography: Li Jin-chai (1946-), male, Professor, research direction: novel functional materials films & ion beam modification of materials. |
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Keywords: | SiCN thin films RF CVD synthesis optical properties X-ray photoelectron spectroscopy (XPS) FTIR |
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