| 高温氧化薄膜应力的测定 |
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| 引用本文： | 杨于兴,穆树人.高温氧化薄膜应力的测定[J].上海交通大学学报,1997,31(1):80-82. |
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| 作者姓名： | 杨于兴 穆树人 |
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| 作者单位： | 国家教委高温材料及高温测试开放实验室 |
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| 基金项目： | 国家自然科学基金,华东分析测试中心测试基金 |
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| 摘 要： | 介绍一种高温氧化薄膜应力的测定技术，它能在一定高温氧化条件下原位测定氧化膜中的生长应力，在某一温度变化范围内原位氧化膜中的热应力，这种技术档以普通衍射仪上进行。
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| 关 键 词： | 氧化薄膜 生长应力 应力 测定 高温 |
Analysis and Measurment of High Temperature Oxide Thin film Stress |
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| Yang Yuxing,Mu Shuren,Zhang Liufeng.Analysis and Measurment of High Temperature Oxide Thin film Stress[J].Journal of Shanghai Jiaotong University,1997,31(1):80-82. |
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| Authors: | Yang Yuxing Mu Shuren Zhang Liufeng |
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| Institution: | Public Laboratory of State Education Commission of P.R.China for High Temperature Materials and High Temperature Tests |
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| Abstract: | A measuring technique of high temperature oxide thin film stress is introduced. The growth stresses of the oxide thin film can be measured on the condition of the constant high temperature oxidation and the thermal stresses can be measured within the variations of a certain temperature. The measuring technique can be carried out with an ordinary diffractometer. |
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| Keywords: | oxide film growth stresses thermal stresses |
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