| 几种紫外薄膜材料的阈值场强分析 |
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| 引用本文： | 胡江川,王万录,马平,陈松林.几种紫外薄膜材料的阈值场强分析[J].重庆大学学报(自然科学版),2005,28(8):89-91116. |
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| 作者姓名： | 胡江川 王万录 马平 陈松林 |
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| 作者单位： | 成都精密光学工程研究中心,四川,成都,610041;重庆大学,数理学院,重庆,400030;重庆大学,数理学院,重庆,400030;成都精密光学工程研究中心,四川,成都,610041 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 采用多光子吸收、雪崩电离模型和多光子吸收与雪崩电离相结合的联合模型计算了几种紫外光学薄膜材料的激光诱导损伤阈值场强,得出雪崩离化模型在紫外部分已不再适用,联合模型的理论结果可用作实验参考.分析了薄膜阈值电场与入射激光频率脉宽的关系,定性地说明了材料带宽与阈值场强的关系.
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| 关 键 词： | 光学薄膜 阈值电场 紫外 |
| 文章编号： | 1000-582X（2005）08-0089-03 |
| 收稿时间： | 2005-04-16 |
| 修稿时间： | 2005-04-16 |
Analysis of the Damage Electric Field Strengths for Several Ultraviolet Thin Film Materials |
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| HU Jiang-chuan,WANG Wan-lu,MA Ping,CHEN Song-ling.Analysis of the Damage Electric Field Strengths for Several Ultraviolet Thin Film Materials[J].Journal of Chongqing University(Natural Science Edition),2005,28(8):89-91116. |
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| Authors: | HU Jiang-chuan WANG Wan-lu MA Ping CHEN Song-ling |
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| Abstract: | The laser induce damage threshold electric field instensity strengths of different materials used in the ultraviolet region, have been calculated by the model of multiphoton absorption ionization, avalanche model and a combination of the two. Avalanche model can not be used in the ultraviolet region, the result of the combination model can be used as reference. The authors analyze the relations between the laser induce damage electric field strengths to optical thin film and laser frequency, pulse duration. The relations between materials band gap and damage threshold electric field strengths is analyzed. |
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| Keywords: | optical thin films damage threshold electric field instensity ultraviolet |
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