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纳米金修饰硅纳米线电极阳极溶出法测定痕量铅、铜
引用本文:侯慧娜,沈国荣,徐胡华,张健. 纳米金修饰硅纳米线电极阳极溶出法测定痕量铅、铜[J]. 南通工学院学报(自然科学版), 2011, 0(4): 31-36
作者姓名:侯慧娜  沈国荣  徐胡华  张健
作者单位:[1]华东师范大学电子工程系,上海200241 [2]上海集成电路技术与产业促进中心,上海201203
基金项目:国家自然科学基金项目(61076070)
摘    要:以浸入沉积的方法在硅纳米线上修饰了金纳米颗粒,并通过电子扫描显微镜(SEM)和X射线荧光分析(XRF)对金纳米粒子修饰的硅纳米线电极表面形貌进行了表征.以修饰后的硅纳米线电极作为工作电极,采用阳极溶出法检测水中痕量铅和铜,考察pH值、富集电位和富集时间对溶出峰的影响,优化出最佳实验条件.在优化的实验条件下,铅Pb2+和铜Cu2+的灵敏度分别为0.649μA/(μg.L-1)和0.177μA/(μg.L-1).检测极限达到0.26μg.L-1和0.67μg.L-1.峰电流与离子浓度在质量浓度25~200μg.L-1的范围内形成良好的线性关系.

关 键 词:硅纳米线电极  差分脉冲溶出伏安法  金纳米粒子    

Determination of Lead and Copper at Gold Nanoparticles Modified Silicon Nanowires Electrode by Anodic Stripping Voltammetry
HOU Hui-na,SHEN Guo-rong,XU Hu-hua,ZHANG Jian. Determination of Lead and Copper at Gold Nanoparticles Modified Silicon Nanowires Electrode by Anodic Stripping Voltammetry[J]. , 2011, 0(4): 31-36
Authors:HOU Hui-na  SHEN Guo-rong  XU Hu-hua  ZHANG Jian
Affiliation:1.Department of Electronic Engineering,East China Normal University,Shanghai 200241,China; 2.Shanghai Integrated Circuit Technology and Industry Promotion Center,Shanghai 201203,China)
Abstract:A novel gold nanoparticles modified silicon nanowires(Au/SiNWs) electrode for anodic stripping analysis of lead(Pb2+) and copper(Cu2+) under the optimum conditions is described in this paper.Gold nanoparticles has been prepared by immersion plating and grafted to silicon nanowires,the morphology of Au/SiNWs electrode is characterized by scanning electron microscope(SEM) and X-ray fluorescence analysis(XRF).The results indicates that the modified electrode displays the excellent linear behavior in the examined concentration(from 25 to 200 μg·L-1).Pb2+ and Cu2+ in 0.1 mol·L-1 HAc-NaAc can be detected with the sensitivity of 0.649 μA/(μg·L-1) and 0.177 μA/(μg·L-1) respectively.The corresponding detection limits are 0.26 μg·L-1 and 0.67 μg·L-1.
Keywords:silicon nanowires electrode  differential pulse voltammeter anodic stripping voltammetry  gold nanoparticles  lead  copper
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