垂直喷淋式原子层沉积反应器设计及数值模拟

提出垂直喷淋式原子层沉积(vertical showehead atom layer depositon reactor,VS-ALDR)反应器的概念。依据原子层沉积的基本原理,对VS-ALDR进行了四种形式的进口设计方案,分别为(1)无间隙扇形分隔进口设计;(2)带中心孔的无间隙扇形分隔进口设计;(3)间隙扇形分隔进口设计;(4)带中心孔的间隙扇形分隔进口设计。在fluent软件中对上述4种设计方案进行流场、温场以及浓度场模拟。根据模拟结果并应用传质理论,对VS-ALDR反应器中反应物浓度的分布进行分析和讨论。分析结果表明中心孔对于TMG和NH3的分隔作用明显。间隙扇形进口有利于TMG和NH3的分隔,并使得衬底处MO源和NH3的浓度集中在喷口下方,与分隔气体的互扩散减少。针对带中心孔的间隙扇形分隔进口反应器,讨论了不同的进口设计方案、高度、分隔气体扇形角、压强、衬底转速、流速以及不同的分隔气体对衬底处浓度分隔效果的影响。该研究结果适用于VS-ALDR输运过程及生长参数确定。为原子层沉积反应器的改进设计提供参考。

vertical showehead atom layer depositon reactor design and simulation

The vertical showehead atom layer depositon reactor(VS-ALDR) reactor is introduced. Based on the basic principles of atomic layer deposition, we designed four forms of VS-ALDR. Respectively (1) No aperture fan-shaped inlet design; (2)No aperture fan-shaped inlet design with center hole; (3)No aperture fan-shaped inlet design; (4) Aperture fan-shaped inlet design with center hole. We performed the simulation of flow field,temperature field and concentration field in the CFD software. According to the simulation results and mass transfer theory, we discussed the concentration distribution on the VS-ALDR. The results show that the center hole had obvious effect for the separation of TMG and NH3. Separating fan-shped inlet design is conducive to sepreate TMG and NH3,.It makes the MO source and NH3 concentrate under the inlet region below with the separating gas inter-diffusion reduction. For the aperture fan-shaped inlet with center hole reactor design, The numerical simulation results show that there exists an optimum separated condition for different inlet design, reactor height, seperated angle, chamber pressure, substrate rotation,inlet velocity and different carrier gas.The result is useful for VS-ALDR transport processes, growth parameters determined and the improvement of reactor design.