| 背面夹缝曝光的光学模拟及其实验 |
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| 引用本文： | 朱军,陈翔.背面夹缝曝光的光学模拟及其实验[J].上海交通大学学报,2014,48(3):367-371. |
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| 作者姓名： | 朱军 陈翔 |
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| 作者单位： | (上海交通大学 微纳科学技术研究院， 上海 200030) |
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| 基金项目： | 国家自然科学基金资助项目(50775149,60976081);教育部高等学校科技创新工程重大项目培育资金资助项目(708037);国家质检总局公益性基金资助项目(201110051) |
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| 摘 要： | 背面夹缝曝光是利用光学衍射效应来制备三维微结构的新方法.采用Matlab对曝光时间和夹缝对三维SU-8结构形貌的影响进行了模拟,并开展了相应的实验研究.结果表明:背面夹缝曝光是获得三维微结构的简便方法.模拟与实验揭示了相同的规律性,即微结构的侧壁倾斜角度取决于夹缝大小;当夹缝不变时,微结构的侧壁倾斜度不变,但微结构的大小随曝光时间而变化.
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| 关 键 词： | 背面夹缝曝光 三维微结构 SU-8胶 |
| 收稿时间： | 2013-08-12 |
Optics Simulation and Process Research of Backside Gap Exposure |
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| ZHU Jun;CHEN Xiang.Optics Simulation and Process Research of Backside Gap Exposure[J].Journal of Shanghai Jiaotong University,2014,48(3):367-371. |
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| Authors: | ZHU Jun;CHEN Xiang |
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| Institution: | (Research Institute of Micro/ Nanometer Science and Technology, Shanghai Jiaotong University, Shanghai 200240, China） |
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| Abstract: | Backside gap exposure is a new method for fabricating three-dimensional structure using optical diffraction effect. In this paper, the inclined angle and dimension of SU-8 three-dimensional structure were simulated using Matlab and the corresponding experimental study was conducted. The results demonstrate that backside gap exposure is a feasible way to fabricate three-dimensional structure. Simulation and experiment results reveal the same regularity that the inclined angle of side wall depends on the size of the gap, and the dimension of microstructure changes with exposure time if the size of the gap is constant. |
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| Keywords: | backside gap exposure three-dimensional microstructure SU-8 photo resist |
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