| 溅射用铁电陶瓷靶的烧结与显微结构分析 |
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| 引用本文： | 卢德新,刘兴阶,胡用时,李佐宜. 溅射用铁电陶瓷靶的烧结与显微结构分析[J]. 华中科技大学学报(自然科学版), 1994, 0(3) |
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| 作者姓名： | 卢德新 刘兴阶 胡用时 李佐宜 |
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| 作者单位： | 华中理工大学固体电子学系 |
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| 摘 要： | 探讨了溅射用铁电陶瓷靶（ＰＺＴ，ＰＬＺＴ）的烧结工艺，并对其显微结构进行了分析。结果表明，采用新的烧结工艺（含保护措施），可以有效地抑制ＰｂＯ的挥发，制备出组织结构及成分均匀、ＰｂＯ含量正常、致密度较高、不变形的符合磁控溅射要求的铁电陶瓷烧结靶。
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| 关 键 词： | 铁电陶瓷靶；液相烧结；显微结构 |
Sintermg and Microstructure of the Ferroelectric Ceramic Target for Sputtering |
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| Lu DexinDept. of Solid-State Electronics,H.U.S.T,Wuhan ,China. Liu Xingjie,Hu Yongshi,Li Zuoyi. Sintermg and Microstructure of the Ferroelectric Ceramic Target for Sputtering[J]. JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE, 1994, 0(3) |
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| Authors: | Lu DexinDept. of Solid-State Electronics H.U.S.T Wuhan China. Liu Xingjie Hu Yongshi Li Zuoyi |
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| Affiliation: | Lu DexinDept. of Solid-State Electronics,H.U.S.T,Wuhan 430074,China. Liu Xingjie,Hu Yongshi,Li Zuoyi |
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| Abstract: | The sintering technology of ferroelectric ceramic target(PZT,PLZT) for sputtering isdiscussed and the microstructure analyzed.The results show that the new sintering technolo-gy(including the protecting methods)is satisfactory and the target prepared meets the re-quirements of magnetically-controlled sputtering as the volatilization of PBO can be con-trolled at a normal content. The microstructure and the distribution of chemical compositionare uniform and the density is high. |
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| Keywords: | erroelectric ceramic target liquid phase sintering microstructure |
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