| 薄膜厚度对Cu膜光电性能的影响 |
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| 引用本文： | 李爱丽,王本军,闫金良,孙学卿,秦清松. 薄膜厚度对Cu膜光电性能的影响[J]. 烟台师范学院学报(自然科学版), 2008, 0(2): 145-148 |
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| 作者姓名： | 李爱丽 王本军 闫金良 孙学卿 秦清松 |
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| 作者单位： | 鲁东大学物理与电子工程学院,山东烟台264025 |
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| 基金项目： | 烟台奇星电子有限公司资助（06h002） |
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| 摘 要： | 在室温条件下，用直流磁控溅射Cu靶制备出了不同厚度的Cu膜，测量了Cu膜的光学透过率和面电阻，分析了光电性质薄膜厚度的变化情况．实验结果表明，随着Cu膜厚度的增加，其光学透过率逐渐减小，透过率在波长为580nm处出现峰值．Cu膜的面电阻随薄膜厚度的增加先急剧减小，然后减小变得缓慢，最后趋于定值．理论模拟了Cu膜的光学透过率随薄膜厚度的变化和光学透过率随入射光波长的变化，理论模拟结果与实验结果吻合．
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| 关 键 词： | Cu膜 直流磁控溅射 光学透过率 面电阻 |
Thickness Dependence of Optical and Electrical Properties of Cu Film |
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| LI Ai-li,WANG Ben-jun,YAN Jin-liang,SUN Xue-qing,QIN Qing-song. Thickness Dependence of Optical and Electrical Properties of Cu Film[J]. Yantai Teachers University journal(Natural Science Edition), 2008, 0(2): 145-148 |
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| Authors: | LI Ai-li WANG Ben-jun YAN Jin-liang SUN Xue-qing QIN Qing-song |
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| Affiliation: | ( School of Physics and Electronic Engineering, Ludong University, Yantai 264025, China) |
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| Abstract: | Cu films were prepared at room temperature by DC magnetron sputtering of Cu targets. The optical transmittance and the sheet resistance of Cu films with different thickness were measured. The experimental results showed that the transmittance and the sheet resistance decreased with increase of the thickness of Cu films. The transmittance reached to the peak at the 580 nm wavelength. The transmittance of Cu films depending on the thickness of Cu films or the wavelength of incident light was simulated. The theoretic result was consistent with the experimental data very well. |
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| Keywords: | Cu film DC magnetron sputtering optical transmittance sheet resistance |
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