| 透射干涉法测量蓝宝石上薄外延硅层的厚度 |
| |
| 引用本文： | 蔡希介,陈庆贵,史日华,王其闵.透射干涉法测量蓝宝石上薄外延硅层的厚度[J].应用科学学报,1984,2(2):170-174. |
| |
| 作者姓名： | 蔡希介 陈庆贵 史日华 王其闵 |
| |
| 作者单位： | 中国科学院上海冶金研究所 |
| |
| 摘 要： | 利用光波的透射干涉原理,提出了一个测量亚微米内蓝宝石上外延硅层厚度的方法,使用不同仪器,在各种波长范围内,对该方法同反射干涉测量法、扫描电镜断面直接测量法进行了比较.结果证明,透射干涉测量薄外延硅层厚度方便易行,精度与反射法相同.
|
| 收稿时间： | 1982-06-07 |
TRANSMISSION INTERFERENCE METHOD FOR MEASURING THE THICKNESS OF THIN SOS FILMS |
| |
| CAI XIJIE,CHEN QINGGUI,SHI RIHUA,WANG QIMIN.TRANSMISSION INTERFERENCE METHOD FOR MEASURING THE THICKNESS OF THIN SOS FILMS[J].Journal of Applied Sciences,1984,2(2):170-174. |
| |
| Authors: | CAI XIJIE CHEN QINGGUI SHI RIHUA WANG QIMIN |
| |
| Institution: | Shanghai Institute of Hetallurgy, Academia Sinica |
| |
| Abstract: | By appling the principle of optical transmission interference, a method for measuring the thickness of SOS films in submicron range has been proposed. After comparing it with the methods of reflection interference in different wavelength range and of direct determining the thickness by SEM, it is concluded that this transmission method for measuring thin thickness of SOS films is more simple and applicable than reflection interference method, however, both accuracies are the same. |
| |
| Keywords: | |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《应用科学学报》浏览原始摘要信息 |
| 点击此处可从《应用科学学报》下载免费的PDF全文 |
|
