| 低红外发射率材料的研究 |
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| 引用本文： | 潘逴,赵振声,何华辉.低红外发射率材料的研究[J].华中科技大学学报(自然科学版),2003,31(7):28-30. |
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| 作者姓名： | 潘逴 赵振声 何华辉 |
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| 作者单位： | 华中科技大学电子科学与技术系 |
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| 摘 要： | 叙述了在铝粉外包覆红外透明粘合剂设计低红外发射率材料的实验过程，讨论了填料、粘合剂、涂层厚度等影响发射率的几个关键因素，结果表明用该方法所研制的样品发射率最低可达到0．678，表明了该途径的可行性。
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| 关 键 词： | 低红外发射率材料 发射率 涂层 |
| 文章编号： | 1671-4512(2003)07-0028-03 |
| 修稿时间： | 2002年12月18 |
Study of the materials with low infrared emissivity |
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| Pan Chuo,Zhao Zhensheng,He Huahui.Study of the materials with low infrared emissivity[J].JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE,2003,31(7):28-30. |
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| Authors: | Pan Chuo Zhao Zhensheng He Huahui |
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| Institution: | Pan Chuo Zhao Zhensheng He Huahui |
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| Abstract: | The material with low infrared emissivity was prepare d by aluminum coated with pigment being non-absorbing in the infrared region. The main factors such as padding, bond and thichness were given in experiments whic h have influence on the emissivity of material. It is seen that the lowest emiss ivity of the prepared samples is 0.678. |
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| Keywords: | low infrared emissivity material emissivity coating Pan Chuo Master Dept of Electronic Sci & Tech Huaz hong Univ of Sci & Tech Wuhan 430074 China |
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