首页 | 本学科首页   官方微博 | 高级检索  
     检索      

低能重离子轰击钛铝靶溅射原子能谱的理论
引用本文:张莱,张竹林.低能重离子轰击钛铝靶溅射原子能谱的理论[J].安徽理工大学学报(自然科学版),2006,26(2):69-75.
作者姓名:张莱  张竹林
作者单位:1. 安徽理工大学计算机科学与技术系,安徽,淮南,232001
2. 安徽理工大学数理系,安徽,淮南,232001
基金项目:安徽省教育厅自然科学基金
摘    要:进一步发展了文献8-9]的各项异性溅射理论,并运用该理论研究了低能氩离子和氙离子分别轰击钛靶和铝靶的溅射原子能量分布(或溅射原子能谱),以及溅射原子谱与离子入射角以及溅射原子出射角的关系.尤其对于氩离子轰击钛靶,作者只设置了唯一参数,新理论就可以很好的解释文献10]的大量实验结果.当然,分析中,新理论忽略了电子阻止的贡献.对于较大的溅射原子出射角,理论值明显小于实验值,这可能是由于直接反冲对溅射原子谱的影响,因为新理论只适合于溅射碰撞级联,所以忽略了直接反冲的贡献.新理论与文献10]大部分实验相符这一事实进一步证明了动量淀积在低能重离子碰撞溅射的重要作用,从而并进一步指导离子碰撞溅射的各种应用.

关 键 词:溅射产额  溅射产额能量分布  各向异性溅射
文章编号:1672-1098(2006)02-0069-07
收稿时间:2005-11-17
修稿时间:2005年11月17

Theoretical Research on Energy Distribution of Sputtered Atoms from Ti and Al Targets Induced by Low Energy Heavy Ion Bombardment
ZHANG Lai,ZHANG Zhu-lin.Theoretical Research on Energy Distribution of Sputtered Atoms from Ti and Al Targets Induced by Low Energy Heavy Ion Bombardment[J].Journal of Anhui University of Science and Technology:Natural Science,2006,26(2):69-75.
Authors:ZHANG Lai  ZHANG Zhu-lin
Institution:1. Dept. of Computer Science and Technology, Anhui University of Science and Technology, Huainan, Anhui, 232001, China;2. Dept. of Mathematics and Physics, Anhui University of Science and Technology, Huainan, Anhui, 232001, China
Abstract:The theory of anisotropy sputtering published in Phys.Rev.B(71(2),026101(2005)) and Radiation Effects and Defects in Solids(159(5),301(2004)) has been modified and used to calculate the sputtering yield energy distributions for Titanium or Aluminum targets bombarded by low-energy argon or xenon ion respectively.The theory has also been used to make researches on the ion incident angle and sputtering emission angle dependences of these sputtering yield energy distributions.As usual,the electronic stopping is ignored in the analysis.In particular,the present theory(modified Sigmund theory) has been shown to fit most of experimental results of sputtering yield energy distributions of Titanium target bombarded by low-energy argon ion published by A.Goehlich et.al.in Phys.Rev.B(62,(2000) 9349-9358)as long as only one parameter was used.The theoretical calculation results have been shown to be smaller than the corresponding experiment results in the cases where the larger ion incident angle and larger sputtering emission angles were considered probably is due to the influence of direct recoil atoms on the energy spectrum.The present theory only treated with sputtering collision cascade and neglected the contribution of direct recoil atoms.The good agreement between present theory and the most of experimental results published by A.Goehlich et.al.clearly demonstrated the great importance of momentum deposited on the target surface in the physical sputtering.Therefore,the theory will certainly guide a variety of applications of ion collision sputtering.
Keywords:Total sputtering yield  Sputtering yield energy distributions  anisotropic sputtering effect
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号