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Preparation of composite abrasives by electrostatic self-assembly method and its polishing properties in Cu CMP
Authors:Huang Yishen  Xu Xuefeng  Yao Chunyan  Hu Jiande and Peng Wei
Institution:Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology of Ministry ofEducation & Zhejiang Province, Zhejiang University of Technology, Hangzhou 310014, China
Abstract:chemico-mechanical polishing polishing slurry composite abrasives polyelectrolyte copper
Keywords:chemico-mechanical polishing  polishing slurry  composite abrasives  polyelectrolyte  copper
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