铝诱导层交换的研究进展

铝诱导层交换是指铝-非晶硅双层膜经低温退火后,铝和非晶硅层的位置发生交换,导致在原来铝层的位置处形成一完整连续的多晶硅层.这一技术的应用将大幅度降低制备多晶硅薄膜的成本.本文针对近几年有关铝诱导层交换的研究进展,包括实验和理论研究两方面的进展,结合铝诱导层交换表征的一具体实例,对影响铝诱导交换的主要因素、层交换的动态过程及其机理作了一个综述.

Progresses on Aluminum-Induced Layer Exchange

The aluminum-induced layer exchange （ALILE） means that the exchange of the location of aluminum layer and amorphous silicon layer upon low-temperature annealing of aluminum-amorphous silicon bilayer. Upon layer exchange, a continuous complete polycrystalline silicon layer is formed at the original location of the aluminum layer. The application of this technique will reduce largely the cost for producing polycrystalline silicon films. In this paper, the progresses in both experimental and theoretical aspects on the study of ALILE are reviewed, focusing on the main effects, kinetics and mechanism of ALILE process.