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| 微波等离子体CVD金刚石薄膜的显微结构 | |
| 引用本文： | 袁逸 杨保雄. 微波等离子体CVD金刚石薄膜的显微结构[J]. 北京科技大学学报, 1994, 16(3): 245-249 |
| 作者姓名： | 袁逸 杨保雄 |
| 作者单位： | 北京科技大学材料科学与工程系 |
| 摘 要： | 用扫描电镜（ＳＥＭ）和透射电镜（ＴＥＭ）对６种微波等离子体ＣＶＤ金刚石薄膜的表面形貌和显微结构进行了研究，结果表明：在金刚石晶粒长大过程中，（１１１）面方向长大时产生密度很高的微挛晶缺陷，而（１００）面方向长大时产生的晶体缺陷较少。 |
| 关 键 词： | 金刚石 薄膜 显微结构 MPCVD |
Microstructure of Diamond Thin Films by Microwave Plasma CVD |
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| Yuan Yi,Yang Baoxiong,Bai Yuanqiang,Wang Jianjun,Lu Fanxiu. Microstructure of Diamond Thin Films by Microwave Plasma CVD[J]. Journal of University of Science and Technology Beijing, 1994, 16(3): 245-249 | |
| Authors: | Yuan Yi Yang Baoxiong Bai Yuanqiang Wang Jianjun Lu Fanxiu |
| Abstract: | The morphology and the microstructure of six different dianond films deposited by microwave plasma CVD have been studied by SEM and TEM.The observations of microstructure indicate that high dencity microtwins are formed during the(111)planes growth and a few of crystal defects are formed during the(100) planes growth. |
| Keywords: | diamond thin films microstructure/MPCVD |
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