CVD金刚石薄膜表面晶形研究

本文较详细地研究了采用ＨＦＣＶＤ方法在Ｓｉ、Ｍｏ等衬底上生长出的不同表面晶形的多晶金刚石薄膜，讨论了生长条件（衬底温度、碳源浓度、反应压强）对金刚石薄膜晶粒形貌的影响．结果表明在ＨＦＣＶＤ方法中，金刚石薄膜表面晶形对生长条件十分敏感，生长条件的微小变化就会导致不同表面晶形的生长．

STUDY OF THE SURFACE MORPHOLOGY OF CVD DIAMOND FILMS

Diamond films have been deposited by the hot filament CVD method on silicon and molybdenum substrates from the mixture gases of acetone and hydrogen. The surface morphologied of the obatined diamond films under various deposition conditions have been observed by scanning electron microscope (SEM).The experimental results strongly indicate that the surface morphologies of the resulting films have closely related to the deposition conditions,i. e., carbon concentration of the mixture gases , substrate temperature and reaction pressure. For silicon substrates, under the higher acetone concentration or lower substrate temperature , the graphite of amorphous carbon component of the resulting films will increase, and have the effect on the surface rnorphology, with the graphite or amorphous carbon component increasing, the surface morphologies show a tentence to display the spherical. For rnolybenum substrates, under the lower reaction pressure, the surface morphologies of the grains consisting the resulting films mainly display a small single crystal cub -octahidron and double small single crystal cub -octahedron ; under the higher reaction pressure,the surface morphologied mainly display the large cauliflower - like. These results show that there are various crystal habits for CVD diamond under various deposition conditions.