| 对靶磁控溅射FeCoN薄膜的结构与磁性 |
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| 引用本文： | 贾辉,韩莉,孙淑晶,孙光东,赵翠梅,王欣.对靶磁控溅射FeCoN薄膜的结构与磁性[J].吉林大学学报(理学版),2011,49(1):125-130. |
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| 作者姓名： | 贾辉 韩莉 孙淑晶 孙光东 赵翠梅 王欣 |
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| 作者单位： | 1. 北华大学 物理学院, 吉林 吉林 132013,2. 吉林大学 材料科学与工程学院, 长春 130012; 3. 惠州学院 电子系, 广东 惠州 516007 |
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| 基金项目： | 科技部基础专项科研项目基金，吉林省科技厅项目基金 |
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| 摘 要： | 利用改进后的对靶磁控溅射系统, 以N2/Ar混合气体为溅射气体, 在未加热的Si(111)衬底上沉积FeCoN薄膜. 采用X射线衍射仪(XRD)、 透射电子显微镜(TEM)、 扫描电子显微镜(SEM)和超导量子干涉仪(SQUID)研究不同Co靶溅射功率对FeCoN薄膜样品的结构、 形貌和磁性性能的影响. 结果表明: 固定Fe靶功率为160 W(电流I=0.4 A), 当Co靶功率为2.4 W(I=0.04 A)时, 薄膜由Co溶入ε-Fe3N中形成的ε-(Fe,Co)3N化合物相构成; 当Co靶功率为58 W(I=0.2 A)时, 获得了Fe3N/Co3N化合物相, 薄膜的饱和磁化强度(Ms)为151.47 A·m2/kg, 矫顽力(Hc)为3.68 kA/m; 当Co靶功率为11.9 W(I=0.07 A)时, 制备出具有高饱和磁化强度的α″-(Fe,Co)16N2化合物相, 薄膜的Ms=265.08 A·m2/kg, Hc=8.24 kA/m.
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| 关 键 词： | ,FeCoN薄膜,α″-(Fe,Co)16N2,饱和磁化强度,矫顽力, |
| 收稿时间： | 2010-01-27 |
Structural and Magnetic Properties of FeCoN Thin Film Deposited by Facing-Target Magnetron Sputtering |
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| JIA Hui,HAN Li,SUN Shu-jing,SUN Guang-dong,ZHAO Cui-mei,WANG Xin.Structural and Magnetic Properties of FeCoN Thin Film Deposited by Facing-Target Magnetron Sputtering[J].Journal of Jilin University: Sci Ed,2011,49(1):125-130. |
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| Authors: | JIA Hui HAN Li SUN Shu-jing SUN Guang-dong ZHAO Cui-mei WANG Xin |
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| Institution: | 1. College of Physics, |Beihua |University, |Jilin |132013, Jilin Province, |China;2. College of Materials Science and Engineering, Jilin University, |Changchun |130012, China; 3. |Department of Electronics, Huizhou College, Huizhou 516007, Guangdong Province, |China |
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| Abstract: | Fe-Co-N films were deposited on an unheated Si (111) substrate by means of developed facing\|target magnetron sputtering with N2/Ar as sputtering gas. The effect of various Co target power on the structure, morphology and magnetic properties of FeCoN films were investigated by X-ray diffraction (XRD), transmission electron microscopy (TEM), scanning electron microscopy (SEM) and superconducting quantum interference device (SQUID), respectively. The results show that when the input power on Fe target was 160 W and Co target power was 2.4 W, the thin films with ε-(Fe,Co)3N were synthesized; when Co target power was 58 W, paramagnetic Co3N phase appeared with ferromagnetic phase Fe3N, saturation magnetization (Ms) of thin film is 151.47 A·m2/kg, coercivity (Hc) is 3.68 kA/m. When Co target power was 11.9 W (I=0.07 A),
α″-Fe,Co)16N2 phase was obtained with a high Ms of 265.08 A·m2/kg and Hc of 8.24 kA/m. |
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| Keywords: | FeCoN thin film α″-Fe16N2 saturation magnetization coercivity |
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