| 基板负偏压对铜基体磁控溅射离子镀铝膜相组成的影响 |
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| 引用本文： | 王玉魁,陈宝清,朱英臣,王斐杰,宋美丽,李国斌. 基板负偏压对铜基体磁控溅射离子镀铝膜相组成的影响[J]. 大连理工大学学报, 1985, 0(3) |
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| 作者姓名： | 王玉魁 陈宝清 朱英臣 王斐杰 宋美丽 李国斌 |
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| 作者单位： | 大连工学院材料工程系离子镀研究室(王玉魁，陈宝清，朱英臣，王斐杰，宋美丽)，大连工学院材料工程系离子镀研究室(李国斌) |
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| 摘 要： | 本文主要论述基板员偏压与铜基体磁控溅射离子镀铝膜的关系。磁控溅射离子镀 铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。膜的相组成主要是由基板 负偏压所决定的。在一定的实验条件下，每一种铜－铝合金相的出现都有一临界负偏压 与之对应．
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| 关 键 词： | 磁控溅射离子镀 基板负偏压 金属表面合金化 |
The Impact of the Suhstrate''''s Negative Bias on the Component Phases of the Magnetron-sputtering Ion-Plating Aluminum Film on Cogper |
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| Wung Yukui,Chen Baoqing,Zhu Yingchen,Wang eijie,Song Meili,L i Guobin. The Impact of the Suhstrate''''s Negative Bias on the Component Phases of the Magnetron-sputtering Ion-Plating Aluminum Film on Cogper[J]. Journal of Dalian University of Technology, 1985, 0(3) |
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| Authors: | Wung Yukui Chen Baoqing Zhu Yingchen Wang eijie Song Meili L i Guobin |
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| Affiliation: | Ion-Plating Research Section D I T |
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| Abstract: | This article mainly deals with the relationship between the negative bias of the substrate and the magnetron-sputtering ion plating aluminum film on the co- pper. The magnetron-sputtering ion plating aluminum film is not simply an out- covering layer of a single substance, but an alloy film containing both aluminum and copper. The film's component phases are primarily decided by the negative bias of the substrate. On the given experimental conditions, the appearance of ev- ery phase of the copper-aluminum alloy will have a corresponding critical negative bias of the substrate. |
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| Keywords: | the magnetron-sputtering ionplating the substrate's negative bias the alloying of motallic surfaces. |
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